상세정보
학술지
A Thin Film Encapsulation Layer Fabricated via Initiated Chemical Vapor Deposition and Atomic Layer Deposition
- 발행일
- 201412
- 출처
- Journal of Applied Polymer Science, v.131 no.24, pp.1-7
- ISSN
- 0021-8995
- 출판사
- John Wiley & Sons
- 초록
- An organic/inorganic hybrid multilayer for encapsulation of organic electronic devices is developed, where the organic polymer layer and the inorganic layer are alternatively deposited by initiated chemical vapor deposition and atomic layer deposition processes, respectively. The thickness of each organic and inorganic layer is optimized to minimize the water vapor transmission rate (WVTR) determined by a Ca test. The produced barrier film shows an outstanding optical property as its light transmittance is average 89.42% at visible light region. The WVTR of the developed thin film encapsulation layer is as low as 2.17 × 10-4 g m-2 day-1 at 38°C, 90% relative humidity (RH). This value is equivalent to 1.29 × 10-5 g m-2 day-1 at ambient condition, which is sufficient to elongate the lifetime of organic electronic devices.
- KSP 제안 키워드
- As 2, Atomic Layer Deposition, Barrier film, Encapsulation layer, Initiated Chemical Vapor Deposition, Light transmittance, Organic-inorganic hybrid, Relative Humidity, Thin film encapsulation, Visible Light, ambient conditions