BROWSE
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Conference Paper
The Influence of UVO etch Time on Nanopatterning of Self Organized Block Copolymer
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- Authors
- Ah Ra Kim, Ye-Sul Jeong, Tea-Sung Kim, So Yun Kim, Hong Seung Kim, Kun Sik Park, Kyu-Ha Baek, Lee-Mi Do
- Issue Date
- 2011-05
- Citation
- International Conference on Molecular Electronics and Devices (IC ME&D) 2011, pp.1-1
- Language
- English
- Type
- Conference Paper
- KSP Keywords
- Block copolymer(BCP)