This study proposes a simple cost-effective method of optical interconnection with a view to minimizing and overcoming the excess loss caused by the alignment tolerance between optical waveguides in the integration/interface process in order to fabricate a large-area optical circuit layer. To that end, a large-area polymeric mold with a continuous channel structure was fabricated. The fabrication process consisted of fabricating the primary polymer mold by using the original master in the polymer replication process and involved the simple alignment of the replicated polymeric mold so that only some sections overlapped with the original master. The dimensions (i.e., width and thickness) of the cavity of the polymeric mold were identical to those of the original master. When the original master was inserted into the cavity of the polymeric mold after having separated the original master and the polymeric mold, the rib structures of the original master and the channel structures of the polymeric mold could be arranged in a passive alignment. A large-area polymeric mold with a continuous channel structure was fabricated by coating a polymeric solution onto the non-overlapping original master. For this study, a polymeric multimode optical waveguide with a length of 200 mm was fabricated using the original master with a length of 130 mm with 50 straight ribs. The excess loss of the proposed large-area multimode optical waveguide interconnection, compared with the original master-based optical waveguide, was 0 dB at 850 nm.
The materials provided on this website are subject to copyrights owned by ETRI and protected by the Copyright Act. Any reproduction, modification, or distribution, in whole or in part, requires the prior explicit approval of ETRI. However, under Article 24.2 of the Copyright Act, the materials may be freely used provided the user complies with the following terms:
The materials to be used must have attached a Korea Open Government License (KOGL) Type 4 symbol, which is similar to CC-BY-NC-ND (Creative Commons Attribution Non-Commercial No Derivatives License). Users are free to use the materials only for non-commercial purposes, provided that original works are properly cited and that no alterations, modifications, or changes to such works is made. This website may contain materials for which ETRI does not hold full copyright or for which ETRI shares copyright in conjunction with other third parties. Without explicit permission, any use of such materials without KOGL indication is strictly prohibited and will constitute an infringement of the copyright of ETRI or of the relevant copyright holders.
J. Kim et. al, "Trends in Lightweight Kernel for Many core Based High-Performance Computing", Electronics and Telecommunications Trends. Vol. 32, No. 4, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
J. Sim et.al, “the Fourth Industrial Revolution and ICT – IDX Strategy for leading the Fourth Industrial Revolution”, ETRI Insight, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
If you have any questions or concerns about these terms of use, or if you would like to request permission to use any material on this website, please feel free to contact us
KOGL Type 4:(Source Indication + Commercial Use Prohibition+Change Prohibition)
Contact ETRI, Research Information Service Section
Privacy Policy
ETRI KSP Privacy Policy
ETRI does not collect personal information from external users who access our Knowledge Sharing Platform (KSP). Unathorized automated collection of researcher information from our platform without ETRI's consent is strictly prohibited.
[Researcher Information Disclosure] ETRI publicly shares specific researcher information related to research outcomes, including the researcher's name, department, work email, and work phone number.
※ ETRI does not share employee photographs with external users without the explicit consent of the researcher. If a researcher provides consent, their photograph may be displayed on the KSP.