Subjects : Plasma dry etching
Type | Year | Title | Cited | Download |
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Conference | 2014 | Normally-off GaN MIS-HEMT Using CF4 Plasma Gate Recess Park Young Rak International Workshop on Nitride Semiconductors (IWN) 2014, pp.1-2 |
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Type | Year | Research Project | Primary Investigator | Download |
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