Subjects : hydrogen diffusion
| Type | Year | Title | Cited | Download |
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| Conference | 2015 | Characterization and Optimization of Plasma-Enhanced Chemical Vapor Deposited SiO2 Film as a Hydrogen Diffusion Barrier in Metal Oxide Thin-Film Transistors Cho Sung Haeng International Meeting on Information Display (IMID) 2015, pp.332-332 |
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