Subjects : plasma composition
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2008 | Model-Based Analysis of the ZrO2 Etching Mechanism in Inductively Coupled BCl3/Ar and BCl3/CHF3/Ar Plasmas 김만수 ETRI Journal, v.30, no.3, pp.383-393 | 10 | 원문 |
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| Type | Year | Research Project | Primary Investigator | Download |
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