Subjects : Formation temperature
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2008 | Process compatible silicon–germanium–antimony heating layer for high density phase-change memory applications Lee Seung-Yun Microelectronic Engineering, v.85, no.12, pp.2342-2345 | 5 | 원문 |
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| Type | Year | Research Project | Primary Investigator | Download |
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