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Subjects : 51 V

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Journal 2015 Highly Stable, High Mobility Al:SnZnInO Back-Channel Etch Thin-Film Transistor Fabricated Using PAN-Based Wet Etchant for Source and Drain Patterning   Cho Sung Haeng  IEEE Transactions on Electron Devices, v.62, no.11, pp.3653-3657 38 원문
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