Subjects : HfO x
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2010 | Effects of N2 and NH3 Remote Plasma Nitridation on the Structural and Electrical Characteristics of the HfO2 Gate Dielectrics Park Kun Sik Applied Surface Science, v.257, no.4, pp.1347-1350 | 35 | 원문 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
|---|---|---|---|---|---|
| No search results. | |||||
| Type | Year | Research Project | Primary Investigator | Download |
|---|---|---|---|---|
| No search results. | ||||