Subjects : HBr/Ar plasma
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2012 | Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl 2/Ar Inductively Coupled Plasma 김대희 Japanese Journal of Applied Physics, v.51, no.10, pp.1-5 | 3 | 원문 |
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| Type | Year | Research Project | Primary Investigator | Download |
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