Subjects : Oxide deposition
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Conference | 2017 | P‐10: High‐Density Plasma Sputtered InZnSnO Thin‐Film Transistors Fabricated by Back Channel Etching Method on Flexible Polyimide Substrate Cho Sung Haeng Society for Information Display (SID) International Symposium 2017, pp.1262-1264 | 5 | 원문 |
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