Subjects : Positive Photoresist
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Conference | 2004 | Novel lithography process for extreme deep trench by using laminated negative dry film resist Jung Moon Youn International Conference on Micro Electro Mechanical Systems (MEMS) 2004, pp.685-688 | 원문 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
|---|---|---|---|---|---|
| No search results. | |||||
| Type | Year | Research Project | Primary Investigator | Download |
|---|---|---|---|---|
| No search results. | ||||