Subjects : Silicon epitaxial layer
Type | Year | Title | Cited | Download |
---|---|---|---|---|
Journal | 2021 | In situ implementation of silicon epitaxial layer on amorphous SiO2 using reduced-pressure chemical vapor deposition Kim Sang Hoon Applied Materials Today, v.24, pp.1-7 | 8 | 원문 |
Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
---|---|---|---|---|---|
No search results. |
Type | Year | Research Project | Primary Investigator | Download |
---|---|---|---|---|
No search results. |