Subjects : Mixture composition
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2009 | Etching Characteristics of VO2 Thin Films Using Inductively Coupled Cl2/Ar Plasma 한용현 Japanese Journal of Applied Physics, v.48, no.8, pp.08HD041-08HD045 | 8 | 원문 |
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| Type | Year | Research Project | Primary Investigator | Download |
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