Subjects : Thermal annealing temperature
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2007 | Electrical and Structural Properties of High-k Er-silicate Gate Dielectric Formed by Interfacial Reaction between Er and SiO2 Films Choi Chel-Jong Applied Physics Letters, v.91, no.1, pp.1-3 | 17 | 원문 |
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| Type | Year | Research Project | Primary Investigator | Download |
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