Subjects : electrode process
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2023 | Analysis of issues in gate recess etching in the InAlAs/InGaAs HEMT manufacturing process Min Byoung-Gue ETRI Journal, v.45, no.1, pp.171-179 | 5 | 원문 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
|---|---|---|---|---|---|
| No search results. | |||||
| Type | Year | Research Project | Primary Investigator | Download |
|---|---|---|---|---|
| No search results. | ||||