Subjects : Carrier Gas Flow Rate
| Type | Year | Title | Cited | Download |
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| Journal | 2025 | Growth Behaviors of InAs/GaAs Quantum Dots Using Metal−Organic Chemical Vapor Deposition with Dual-Channel AsH3 Supply and H2 Carrier Gas Flow Rate Variation 김호성 Crystal Growth and Design, v.25, no.16, pp.6628-6635 | 원문 |
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