Subjects : CHF 3
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2010 | Etching Characteristics and Mechanism of ZnO and Ga-Doped ZnO Thin Films in Inductively Coupled HBr/Ar/CHF3 Plasma 함용현 Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-5 | 5 | 원문 |
| Journal | 2005 | Etching Characteristics of Ge2Sb2Te5 Using High-Density Helicon Plasma for the Nonvolatile Phase-Change Memory Applications Yoon Sung Min Japanese Journal of Applied Physics, v.44, no.24-27, pp.L869-L872 | 36 | 원문 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
|---|---|---|---|---|---|
| No search results. | |||||
| Type | Year | Research Project | Primary Investigator | Download |
|---|---|---|---|---|
| No search results. | ||||