Subjects : Inductively coupled plasma etching
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Conference | 2019 | Normally-off Field Effect Transistors using fine controlled Recess under Gate Area on AlGaN/GaN Heterostructures Kim Zin-Sig 대한전자공학회 학술 대회 (추계) 2019, pp.215-218 |
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