Subjects : Nonlinear behaviors
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2008 | Effect of gas mixing ratio on etch behavior of ZrO2 thin films in BCl3∕He inductively coupled plasma 김만수 Journal of Vacuum Science and Technology A, v.26, no.3, pp.344-351 | 14 | 원문 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
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| Type | Year | Research Project | Primary Investigator | Download |
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