Subjects : Electrical durability
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2012 | Electrowetting Lens Employing Hemispherical Cavity Formed by Hydrofluoric Acid, Nitric Acid, and Acetic Acid Etching of Silicon 이준규 Japanese Journal of Applied Physics, v.51, no.6 PART 2, pp.1-7 | 11 | 원문 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
|---|---|---|---|---|---|
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| Type | Year | Research Project | Primary Investigator | Download |
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