Subjects : Hemispherical cavity
| Type | Year | Title | Cited | Download |
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| Journal | 2012 | Electrowetting Lens Employing Hemispherical Cavity Formed by Hydrofluoric Acid, Nitric Acid, and Acetic Acid Etching of Silicon 이준규 Japanese Journal of Applied Physics, v.51, no.6 PART 2, pp.1-7 | 13 | 원문 |
| Conference | 2011 | Electrowetting Lens Employing Hemispherical Cavity Formed by HNA Etching 이준규 International Microprocesses and Nanotechnology Conference (MNC) 2011, pp.1-2 |
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