Subjects : thick resist
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Conference | 2004 | Novel lithography process for extreme deep trench by using laminated negative dry film resist Jung Moon Youn International Conference on Micro Electro Mechanical Systems (MEMS) 2004, pp.685-688 | 원문 |
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| Type | Year | Research Project | Primary Investigator | Download |
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