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Registered MEMORY DEVICES INCLUDING DIELECTRIC THIN FILM AND METHOD OF MANUFACTURING THE SAME

공간전하 제한전류 특성을 가지는 유전체를 이용한 비휘발성 메모리 소자
이미지 확대
Inventors
Sung-Yool Choi, Ryu Min Ki, Ansoon Kim, Yu Han Young, Chil Seong Ah
Application No.
11607500 (2006.12.01)
Publication No.
20070126045 (2007.06.07)
Registration No.
7960774 (2011.06.14)
Country
UNITED STATES
Project Code
05IF1100, Development of Organic Materials for Gigabit Organic Memory, Sung-Yool Choi
Abstract
A memory device including a dielectric thin film having a plurality of dielectric layers and a method of manufacturing the same are provided. The memory device includes: a bottom electrode; at least one dielectric thin film disposed on the bottom electrode and having a plurality of dielectric layers with different charge trap densities from each other; and an top electrode disposed on the dielectric thin film. Therefore, a memory device, which can be readily manufactured by a simple process and can be highly integrated using its simple structure, can be provided.
KSP Keywords
Bottom electrode, Dielectric thin film, charge trap, dielectric layer, different charge, memory device, simple process, simple structure, thin film(TF), top electrode