Registered
METHOD OF FABRICATING NANOIMPRINT MOLD
- Inventors
-
Park Jonghyurk, Lee Junghyun, Hyoyoung Lee, Bang Gyeong Sook, Choi Nak Jin
- Application No.
-
11505395 (2006.08.17)
- Publication No.
-
20070128549 (2007.06.07)
- Registration No.
- 7419764 (2008.09.02)
- Country
- UNITED STATES
- Abstract
- Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL) process, and transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography (NIL) process to complete an NIL mold. Accordingly, the method can easily fabricate the nanoimprint mold at low costs on a quartz or glass substrate, which is not suitable for an EBL process to produce sub-100 nm patterns, by utilizing the advantages of the EBL process with a resolution of tens of nanometers.
- KSP Keywords
- E-beam, E-beam lithography, Glass substrate, Nanoimprint lithography(NIL), Pattern structures, fine pattern, nanoimprint mold