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Registered METHOD OF FABRICATING NANOIMPRINT MOLD

Inventors
Park Jonghyurk, Lee Junghyun, Hyoyoung Lee, Bang Gyeong Sook, Choi Nak Jin
Application No.
11505395 (2006.08.17)
Publication No.
20070128549 (2007.06.07)
Registration No.
7419764 (2008.09.02)
Country
UNITED STATES
Abstract
Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL) process, and transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography (NIL) process to complete an NIL mold. Accordingly, the method can easily fabricate the nanoimprint mold at low costs on a quartz or glass substrate, which is not suitable for an EBL process to produce sub-100 nm patterns, by utilizing the advantages of the EBL process with a resolution of tens of nanometers.
KSP Keywords
E-beam, E-beam lithography, Glass substrate, Nanoimprint lithography(NIL), Pattern structures, fine pattern, nanoimprint mold