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Detail
Registered ORGANIC/INORGANIC THIN FILM DEPOSITION DEVICE AND DEPOSITION METHOD
- Inventors
- Seongdeok Ahn, Kang Seung Youl, Ji-Young Oh, Chul Am Kim, Suh Kyung Soo, Baek Kyu-Ha, In-Kyu You, Gi Heon Kim
- Application No.
- 11950606 (2007.12.05)
- Publication No.
- 20080138517 (2008.06.12)
- Registration No.
- 7799377 (2010.09.21)
- Country
- UNITED STATES
- Project Code
- 06MB2300, Flexible Display, Cho Kyoung Ik
- Abstract
- Provided is a method for depositing an organic/inorganic thin film. The method includes: i) heating a source vessel containing an organic material and an inorganic material; ii) transferring a deposition gas to a process chamber; iii) distributing the deposition gas onto a substrate disposed in the process chamber; iv) purging the process chamber; v) heating an activating agent source vessel; vi) transferring a heat initiator gas phase to the process chamber; vii) distributing the heat initiator gas phase onto the organic or inorganic material monomer deposited on the substrate through the process chamber, and forming an organic/inorganic thin film; and viii) exhausting the heat initiator gas phase and purging the process chamber. Depositing the organic/inorganic thin film in a time-division manner, the thickness of the thin film can be accurately adjusted and the deposition can be uniformly performed when the thin film is deposited on a large-scale substrate.
- KSP Keywords
- Activating agent, Deposition method, Film deposition, Gas phase, Inorganic material, Organic materials, Thin film deposition, large-scale, thin film(TF)