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Registered BIOSENSOR AND METHOD OF MANUFACTURING THE SAME
- Inventors
- Tae-Youb Kim, Rae-Man Park, Yang Jong-Heon, Yu Han Young, Jang Moon Gyu
- Application No.
- 12195305 (2008.08.20)
- Publication No.
- 20090152597 (2009.06.18)
- Registration No.
- 8022444 (2011.09.20)
- Country
- UNITED STATES
- Project Code
- 07MB2700, Ubiquitous Health Monitoring Module and System Development, Park Seon Hee
- Abstract
- Provided are a biosensor with a silicon nanowire and a method of manufacturing the same, and more particularly, a biosensor with a silicon nanowire including a defect region formed by irradiation of an electron beam, and a method of manufacturing the same. The biosensor includes: a silicon substrate; a source region disposed on the silicon substrate; a drain region disposed on the silicon substrate; and a silicon nanowire disposed on the source region and the drain region, and having a defect region formed by irradiation of an electron beam. Therefore, by irradiating a certain region of a high-concentration doped silicon nanowire with an electron beam to lower electron mobility in the certain region, it is possible to maintain a low contact resistance between the silicon nanowire and a metal electrode and to lower operation current of a biomaterial detection part, thereby improving sensitivity of the biosensor.
- KSP Keywords
- Contact resistance(73.40.Cg), Electron Beam, High concentration, Low contact resistance, Silicon nanowires(SiNWs), Silicon substrate, Source region, doped silicon, electron mobility, metal electrode