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Registered THIN FILM DEPOSITING APPARATUS

박막 증착 장치
이미지 확대
Inventors
Cheong Woo-Seok
Application No.
13182590 (2011.07.14)
Publication No.
20120090543 (2012.04.19)
Registration No.
9115425 (2015.08.25)
Country
UNITED STATES
Abstract
Provided is a thin film depositing apparatus. The thin film depositing apparatus includes: a loading chamber loading a plurality of substrates; a first process chamber connected to the loading chamber and including a plurality of sputter guns inducing a first plasma on the plurality of substrates; a buffer chamber connected to the other side of the first process chamber facing the loading chamber; and a substrate transfer module simultaneously passing the plurality of substrates between the plurality of sputter guns during a process using the first plasma and transferring the plurality of substrates from the first process chamber to the buffer chamber.