BROWSE
Detail
Registered THIN FILM DEPOSITING APPARATUS
- Inventors
- Cheong Woo-Seok
- Application No.
- 13182590 (2011.07.14)
- Publication No.
- 20120090543 (2012.04.19)
- Registration No.
- 9115425 (2015.08.25)
- Country
- UNITED STATES
- Abstract
- Provided is a thin film depositing apparatus. The thin film depositing apparatus includes: a loading chamber loading a plurality of substrates; a first process chamber connected to the loading chamber and including a plurality of sputter guns inducing a first plasma on the plurality of substrates; a buffer chamber connected to the other side of the first process chamber facing the loading chamber; and a substrate transfer module simultaneously passing the plurality of substrates between the plurality of sputter guns during a process using the first plasma and transferring the plurality of substrates from the first process chamber to the buffer chamber.