ETRI-Knowledge Sharing Plaform

KOREAN
특허 검색
Status Country
Year ~ Keyword

Detail

Registered SEMICONDUCTOR APPARATUS AND MANUFACTURING METHOD THEREOF

열방출이 용이한 반도체 기판의 비아홀 제작 방법
이미지 확대
Inventors
Min Byoung-Gue, Hyung Sup Yoon, Mun Jae Kyoung, Kim Seong-Il, Jongmin Lee
Application No.
13549795 (2012.07.16)
Publication No.
20130026631 (2013.01.31)
Registration No.
8692371 (2014.04.08)
Country
UNITED STATES
Project Code
10MB4400, Open Lab Power Amplifier Platform Technology for Wireless Communication and xAN, Hyung Sup Yoon
Abstract
Disclosed are a semiconductor apparatus and a manufacturing method thereof. The manufacturing method of the semiconductor apparatus includes: forming a semiconductor chip on a semiconductor substrate; adhering a carrier wafer with a plurality of through holes onto the semiconductor chip; polishing the semiconductor substrate; forming a first via hole at the rear side of the polished semiconductor substrate; forming a first metal layer below the polished semiconductor substrate and at the first via hole; and removing the carrier wafer from the polished semiconductor substrate.
KSP Keywords
Manufacturing method, Semiconductor chip, Via-hole, metal layer, rear side, semiconductor substrate, through-holes