상세정보
등록 고분자 전도층 제조방법
- 출원번호
- 14957316 (2015.12.02)
- 공개번호
- 20160163426 (2016.06.09)
- 등록번호
- 9825226 (2017.11.21)
- 출원국
- 미국
- 협약과제
- 13MB2100, 유연성 철강소재기판상에서 효율13%를 갖는 Si/SiGe 탠덤 박막태양전지개발, 윤선진
- 초록
- Provided is a method for manufacturing a conductive film. The method for manufacturing a conductive film includes providing a polymer thin-film on a base film, treating the polymer thin-film by using 10 M to 15 M of nitric acid, and washing the polymer thin-film treated with nitric acid. The nitric acid treatment is performed at room temperature for about 7 minutes to about 13 minutes.
- KSP 제안 키워드
- Conductive film, Nitric acid treatment, Room-temperature, acid treatment, nitric acid, thin film(TF)
- 패밀리
| 구분 | 특허 | 출원국 | KIPRIS |
|---|---|---|---|
| 등록 | 전도성 필름 제조 방법 | 대한민국 | KIPRIS |