ETRI-Knowledge Sharing Plaform

4h-Sic Process Conditions High Performance Breakdown Voltage(BDV) Power Device Trench Gate Process Complexity Pin Photodiodes Spectral Range Forming Processes Etch Rates Boron Doping Diffusion Temperature Near-Ir Deep Trench Silicate Glasses Process Simulation Oxidation Process Fabrication Process Ir Spectral Doping Concentration Doping Process Leakage Current Response Time CMOS IC Components Technology Electrical Properties(I-V curve) Experimental Design Etch Selectivity Electrical Sensing Gas Composition High Voltage High-Purity Ict Convergence Nanoimprint Lithography Nano-Sized Power Diode Phase Error Super-Junction Trench Etching Trench Power Mosfets Ultra-Thin High-Precision Charge Balance Center Wavelength Direct Oxidation Dielectric Stability Dc Bias Voltage Dental Radiograph Etch Profile High-Quality Ion Bombardment Master Mold Mos Devices Nano Resonator Pin Diode Titanium Silicide Uniformly Distributed 700 V Inductively-Coupled Plasma(ICP) Annealing Process Boron Diffusion Cross-Sectional Area(CSA) Etching Process Film Thickness Gate Dielectric Insertion Loss Integrated Circuit Oxide Etching Plasma Etching Printed Circuit Board(PCB) Process Pressure Promotion Strategy Sic Mosfet Silicon Deep Etching Sio 2 Size Reduction Source Power Support Project X-Ray Imaging Etching Conditions Flow Rate Glass Doping High Aspect Ratio Photo Response Post Oxidation Process Factors Rf Power Silicon Pixel Detector Thermal Oxidation 22 Nm Arrayed Waveguide Grating(AWG) Complementary Metal-Oxide-Semiconductor(CMOS) Fully Depleted(FD) Flat-Band Voltage High Resistivity High Temperature Interface Characteristics Ion Implantation N-Type Silicon Recess Gate RF LDMOS Simulation Study Wire-Bonded Block Assembly Capacitance-Voltage Compound Semiconductor Human Teeth Micro-Features Process Technology Patterning Technique Silicon Substrate Semiconductor Integrated Transverse Electric Anisotropic Wet Etching Boron Concentration Electrical Characteristics Koh Solution Neural Network Pixel Readout Reactive Ion Etching(RIE) Re-Oxidation Silicon Nitride Triple-Gate Center Point Charge Density Depletion Width Effective Dielectric Flow Ratio Gas Mixture Interface Properties Interface Trap Density Imaging Device Large Area Lateral Diffusion Mos Capacitor Memristor Device Neuromorphic Hardware Polycrystalline Silicon(poly-Si) Response Characteristics Si Substrate Si Etching Smart Sensor Thin Structure X-Ray Image