ETRI-Knowledge Sharing Plaform

Core/Shell Nanowires Schottky Diode Sige Hbt Ge/Si Core/Shell Schottky Junction Quality-Factor(Q-factor) Spot Size Room-Temperature Absorption Edge Fabrication Process High Responsivity Integrated Circuit Reduced Pressure Chemical Vapor Deposition P-I-N Photodetectors Silicon Wafer Pattern Recognition Slab Waveguide Low Dark Current Process Technology 3-Db Bandwidth Neural Network Electrical Characteristics Strain Gradient Thin Film Resistor Ge Photodetectors Directional Coupler(DC) Creative Technology Annealing Temperature 2d Material Semiconductor Diodes Single Nanowire Leaky Mode High Speed N-Type Transistors Oxidation Of Silicon Annealing Conditions Transmission Electron Microscopy(TEM) Time Effect Reconfigurable Fet Selective Epitaxial Growth(SEG) Anti-Stiction Coating Annealing Time Base Structure Beam Profile Contact Size Cross-Sectional Imaging Current Research Deposition Technique Doped Si Electrical Properties(I-V curve) Effective Power Focal Length Group Iv Semiconductor Hole Carriers Key Parameters Si Nanowires Pattern Analysis Process Conditions Photoelectric Characteristics Photonic Devices Petri Net(PN) Variation Effects Vls Process Wake-Up W Metal 6 Ghz Non-Volatile Memory(NVM) Novel Technique Need For Junction Formation Soi Process Broadband Photodetector Crystal Plane Charge Trap Carrier Confinement Epitaxial Lateral Overgrowth Flash-Based Ghz Vco High-Quality High-Energy Particles High-Level Simulation Internal Photoemission Minimum Gap Model Parameter Noise Performance Numerical Aperture Sense Amplifier(SA) Low Power Leakage P-Type Silicon Waveguide Grating Coupler Ultra-High Performance 2d Semiconductors Separation Process Technology Forecasting Top Electrode Tensile Strain Total Ionizing Dose Rectifying Behavior Remnant Polarization Scanning Electron Microscopy(S.E.M.) And Systems Cutoff Frequency Coupled Beam Emitter Layer Eye Diagram Electron Microscopy Analysis Even Longer Wavelength Field-Effect Transistors(FETs) Flicker Noise(1/f) Highly Efficient Ion Gel Laser Light Lc Tank Mid-Wavelength Infrared Metal-Semiconductor Monte-Carlo Simulation(MCS) Metal Deposition Noise Upconversion Sio 2 Soft Errors 5 Nm Photo Detection Power Semiconductor Silicate Glasses Thermal Variation Ultra-Thin Body(UTB) Sulfurization Method Type-Ii Heterojunction Surface Roughness Analysis Silicon-Based Band Gap Chemical Mechanical Polishing(CMP) Crystalline State Carrier Density Electronic Structures Forward And Reverse Glass Materials Hydrogen Silsesquioxane Ir Sensor Infrared Detector Intelligent Greenhouse Light Wave Lenet-5 Model-Based Memory Applications Resistance Change Surface Potential Spice Simulation Single Event Effect(SEE) Process Parameters Ultra-High Vacuum Chemical Vapor Deposition X-Ray Diffraction Analysis Techno-Economic Study Operating Speed Si Layer Building Block Tail Current Transition-Metal Dichalcogenides(TMDCs) Transit Time Silicon Epitaxial Layer System-On-Chip(SoC) Radiation Effects Base Layer Chip Area Cosmic Radiation Energy Band Structure Flash Memory Array Gaussian Functions Gate Stack High Throughput(HTP) Ic Reliability Mid-Infrared(MIR) Micro-Pressure Rf Performance Sound Performance Semiconductor Heterojunction Superior Performance Light Sources Prism Coupling Method Pressure Sensor Parameter Values Training Speed Silicon Electronics Applied Bias Blue Laser Beam Propagation Method Charge Transport Compact Model Device Size Density Change Electron Beam Lithography Heterojunction Bipolar Transistors(HBTs) Gel Matrix Hybrid Electronics Heterojunction Barrier Initial State Maximum Oscillation Frequency N-Type Si Reverse Bias Semiconductor Process Schottky Photodiode Performance Tradeoffs Polarization Switching Ultra-Fine Single Wafer Window Size Optimal Conditions Output Coupling Optimized Process Thermal Noise Transport Model Research Trends Silicon-Germanium(SiGe) Active Devices Build-Up Time Batch Normalization Bulk Silicon Diffraction Pattern Displacement Damage Full Width Highly Crystalline Heavily Doped Intensity Profile Low Phase Noise Low Frequency Noise Limiting Factor Density Functional Theory(DFT) Resistance Variation Silicon Device Semiconductor Nanowires Potential Barrier Wide Range 2 Mm Waveguide Photodetector On-Chip Measurement Optical Devices Power Demand Photonic Properties Silicon-On-Insulator (Soi) Technology And Logic Gates Bias Voltage Current-Voltage Characteristics Diffraction Limit Differential Pair Data Transmission Electrical Components Electrical Devices Generalization Performance Ge-On-Si High Resistance High Frequency(HF) High-Resolution X-Ray Diffraction Hexagonal Boron Nitride(h-BN) Local Area Low Noise Low-Cost Localized Oxidation Lithography Process Minimum Noise Figure Si 3 System Failure Pulse Width Van Der Waals (Vdw) Heterostructures 2.3 Ghz 3.5 Ghz 1550 Nm Supply Voltage