ETRI-Knowledge Sharing Plaform

A-Si:H Solar Cells Rf-Magnetron Sputter Deposition Deep Traps High Efficiency Plastic Substrate High Performance Room-Temperature Metal-Insulator Transition On/Off Current Ratio Amorphous Silicon Solar Cells Ga-Doped Zno Refractive Index Si Substrate Annealing Temperature Dielectric Constant Pentacene Thin-Film Transistors Applied Physics Back Reflector Sputter Deposition Technique High Transmittance Glass Substrate Short Circuit Current Density Power Conversion Efficiency Ultra-Thin Building-Integrated Photovoltaics Ag-Al Transfer Characteristics Zno Thin Films Sio 2 Film Thickness Dual-Gate Structure Resistance Change Si Wafer Electrical And Optical Properties Fill Factor Transparent Conductive Oxide Dielectric Layer Bottom Layer Aqueous Solution High Mobility High Transparency Growth Rate Gate Insulator Ultra Low Organic Thin-Film Transistors (Otfts) 3 V Ag Film Figure Of Merit Voltage Bias Semitransparent Solar Cell Perovskite Solar Cells Optical Interference Gate Electrode Crystalline Volume Fraction Long-Term Memory Silicon Heterojunction Solar Cells Next-Generation Vanadium Dioxide Films Highly Conductive Polycrystalline Silicon Thin-Film Transistor Stress Reduction A-Si:H Thin Film Solar Cell Plasma Oxidation 5 Nm Thermal Stability(TGA) Passivation Layer Optical And Electrical Properties And Gate A-Si:H Films Ti Content Low Resistivity Abrupt Change Antireflection Coating Flow Rate Reference Cell Gallium Doped Zinc Oxide(GZO) As 2 Gzo Film Surface Passivation Low Sheet Resistance Synaptic Transistors Stainless Steel Substrate Shunt Resistance Channel Layer Defect Passivation Transition-Metal Dichalcogenides(TMDCs) Light Sources 20 Nm Ge Profile Sol-Gel Process Pulse Width Surface Treatments Dangling Bonds Chemical Reaction(Biomimetic) Etch Rates High Open Circuit Voltage Ge Content 4-Ethylenedioxythiophene):Poly(4-Styrenesulfonate)(PEDOT:PSS) Inductively Coupled Plasma Chemical Vapor Deposition Visible Range Low Temperature Poly-Si Growth Temperature Si Surface Sequential Lateral Solidification Interfacial Layer Practical Application Surface Tension(ST) Conversion Layer Aluminum Silicate Si Layer Optical Transmittance Negative Differential Transconductance High Conductivity Low Pressure N-Type Si Interface Layer Reflected Light Hydrogen Dilution Ratio Surfactant-Assisted Synaptic Behavior Poly-Si Film Optical Pulse Sol-Gel Method Antireflection Layer Electrical And Optical Characteristics Higher Efficiency Multilayer Electrode Solar Windows Sodium Dodecyl Sulfate Low-Temperature Polycrystalline Silicon(LTPS) Effective Lifetime Full Swing Precursor Film P-Zno Near-Ir Low Voltage Stoney Equation Chemical Vapour Deposition(CVD) Light Scattering Wide Range Carrier Mobility Various Colors Various Substrates Supply Voltage A-Sige:H Uv Light Ag Thin Film Single-Layered Intrinsic Layer Deposition Conditions Cell Structure O 3 Optical Thickness Phase Change Material(PCM) Number Of Cycles Flexible Device Absorption Coefficient Creative Technology 1/F Noise Novel Approach Absorbing Layer Nonvolatile Memory Devices High-Quality Highly Flexible Capping Layer Threshold Voltage Control Electronic Devices Buffer Structure Cost-Effective Synaptic Devices Transparent Conducting Films Internet Of Thing(IoT) Nonlinear Coefficient Thickness Variation Subthreshold Swing(SS) Post-Annealing Process Logic Devices Composition Profile Coating Layer Thermal Insulation Properties Different Thicknesses Flexible Polymer Trap Sites Aqueous Medium As 4 Ald Process Film Density Treatment Method Gate Voltage Bottom Gate Hydrogen Treatment Gas Composition 2d Nanosheets Interface Region Led Light Source Fluorine-Doped Tin Oxide(FTO) Surface Orientation Interlayer Dielectric Negative Differential Resistance(NDR) Organic Layers Process Temperature Working Gas Silicon Thin Film Solar Cells Transmitted Light Nitrogen Insertion Intermediate Phase Exfoliated Nanosheets Simple Formula Nitric Acid Treatment Sige Thin Film High Gain Vertical Heterostructure Spectral Conversion Without Damaging High Reflectivity Polymeric Surfactant Polycrystalline Silicon Film Boron-Doped Ion Current Density Selective Removal Hysteresis Voltage Organic Solvents Graphene Exfoliation Excellent Performance Intermediate States Unique Characteristics Conductance Measurements Adsorption Rate Two-Dimensional Dichalcogenide Fowler-Nordheim (F-N) Stress Light Intensity Commercial Application Graded Bandgap Small Sulfur Absorption Intensity 4.7 V Visible Light Wavelength Trap Charges Angular Dependence Ag Adhesion Continuous Supply P/I Interface Nanocomposite Thin Films Poly(3-Hexylthiophene)(P3HT) Metallic Behavior Input Power Low Leakage Current Ag Electrode Etch Selectivity As-Deposited Film Self-Limiting Phase Separation Performance Improvement Measurement System Tetragonal Structure Multi-Level Storage Dye-Sensitized Solar Cells(DSCs) Thin Film Stress Oxidation Temperature Moving Vehicle Minimum Noise Conductive And Transparent Pedot:Pss Films Synaptic Functions Electrical Performance Diluted Nitric Acid Surface Aggregation P-Type Metal-Oxide Semiconductor Uniformly Distributed Functional Films Double Buffer Zirconium Oxide Wavelength Region Color Modulation Effective Carrier Lifetime Interface Oxide Highly N-Doped Si Solar Cells V2o5 Films Window Layer An Inverter Film Stress Measurement Electrical Behaviour Effect Of Deposition High Sensitivity Independent Control Conducting Materials Multilayered Films Sequential Deposition Double Layered Hysteresis-Free Metal-Oxide-Semiconductor Field-Effect Transistor(MOSFET) Learning Mechanism Human Memory Oxide Field Reflection And Transmission Vanadium Dioxide Thin Film Improved Stability Sige Pmosfets Sulfide Films Adhesion Test Low-Temperature Growth Organic Inverters Surfactant-Free Rf Power Density Silicon Dioxide Artificial Intelligence Matrix Analysis Current Threshold Heat Capacity Plasma Power 3-Cyclopentadiene Flexible Metal Foil Oxide Trap Density Etch Characteristics Multi-Channel Lift-Off Patterning Effective Configuration Thermal Sensors Transparent Conductive Electrodes W Metal Chemical Degradation Rough Substrates Operating Pressure Saturation Mobility Sacrificial Layer Absorbing Materials Length Variation Depletion Mode Cycle Ratio Plasma-Induced Damage Graphene Nanosheet Simple Structure Methyl Ester Bending Test As Impurity P-Doped Optical Filters Logic Inverter Photo-Carrier Reduced Pressure Chemical Vapor Deposition Leakage Current Density Depletion Charge Non-Toxic Water Vapor Transmission Ag Layer Molybdenum Dichalcogenide Pulse Intervals Low-Temperature Plasma-Enhanced Atomic Layer Deposition Multi-Wafer Optoelectronic Properties Reflection Spectrum Input Data Vanadium Oxide High-Resolution Transmission Electron Microscopy Low Rf Power Highly Efficient Trapped Charge Dark Conditions In-Situ Hydrogen Built-In Potential Strongly Correlated Doped Poly-Si J Sc Highly Concentrated On/Off Ratio Trade-Off Small-Scale Turn-On Voltage Si Content Electrical Power Generation Polyimide Substrate Polyvinyl Alcohol (Pva) Gas Flow Ratio Treatment Techniques Nitrogen Gas Drain Current Optimal Performance Electric Circuit Real-World Applications Conduction Characteristics Al-Doped Zno(ZnO:Al) Transconductance Modulation High-K Memory Behavior Nanocomposite Film Short-Term Plasticity Effective Light Trapping Resistance Property Postdeposition Annealing(PDA) Tensile Strain Multi-State Hole Concentration High Stability Oxide-Free Semitransparent Electrodes Current-Voltage Curves Dielectric Films Light Harvesting Surface Structure Thermal Response Subthreshold Slope(SS) Organic Devices Butyric Acid Thin-Film Devices Memory Window Average Power Surface Morphology And Roughness Fabrication Process Counter Electrode Laser Damage Cycle Number Semiconductor Device Integrated Circuit Structural Phase Transition Catalytic Effect Highly Stretchable Weave Structure External Quantum Efficiency Surface Reflection Gate Dielectric Film Mott Insulator Floating Gate Film Characteristics Large Area Deposition High-Density Correlated Material Oscillation Frequency Indium Oxide Thin Films Deposition Parameters Optoelectrical Properties Performance Bipv Nano-Gap Electrode Heat Loss Comprehensive Study Heat Treatment Gap Distance Wafer-Scale X-Ray Diffraction Study Ion Flux Raman Spectroscopy Metallic Conductivity Ga-Doped Zinc Oxide Etch Threshold Self-Aligned Hall Mobility Cut-Off Wavelength Carrier Concentration Plasma Discharge Number Of Pulse Small Molecules VO 2 Heating Test Current-Voltage Measurements Photogenerated Carriers Memory Applications Surface Material Semiconducting Properties Intelligent Network Radio Frequency Magnetron Sputtering Flexible Solar Cells Inversion Voltage Wavelength-Dependent Emission Spectrum High Breakdown Field Front Electrodes Rigid Substrate Process Parameters Two-Terminal Multilayered Structure Amorphous Silicon Film Shadow Mask Flow Reactor Flexible And Transparent Flow-Type Reactor Voltage Regulator(VR) Ceramic Target Pulse Time Electrostatic Potential Time Constant Fluorescent Light Band-Gap Energy Atomic Layer Deposition Method Channel State Information(CSI) Hysteresis Characteristics Low Light Gap Width Pull-Out High-Intensity Laser Compressive Stress Photo Response Doped Zno Films Transparent Conducting Oxide Film Rf-Magnetron Sputtering Method Epitaxial Growth Resistive Switching Behavior Metal Phase Mechanical Flexibility Thermal Properties Thin Metal Layer N-Type Polycrystalline Silicon Photovoltaic Devices Composite Filler Thermal Loss Clock Power Surface Roughness Activation Energy Metal-Semiconductor Transition Injection Level Photo-Conductance Polymer-Based Photo-Induced Current Ethyl Alcohol Heating Rates Organic Materials Electrospinning Technique Energy Consumption H2 Dilution Heat Transfer Equations Hafnium Dioxide Red-Shift Re-Absorption Solar Cell Performance Reduction Behavior Fabrication And Characterization Process Reliability Light Illumination Glass Frit Polystyrene Sulfonate Bending Radius Write-Once-Read-Many Energy-Effective Building-Integrated Pv Gate Bias Convective Heat Transfer Coefficient Mo Films Al Alloy Films Electron Traps Back Gate Pressure Range Zno Quantum Dots Doped Silver Low Crystalline Transparent Devices Silicon Process Pentacene Transistors Electrode Layer Tco-Free Conventional Surfactant Monoclinic Structure Si Devices Acid Mixture Synaptic Plasticity Simple Method Surface Reflectance Oxide Structure Thick Films Cyclic Loading Visual Information Amorphous Substrate Large Grain Thermal Cycle Photovoltaic Cell(PV) Ambient Temperature Phase-Change Random Access Memory(PRAM) Complementary Metal-Oxide-Semiconductor(CMOS) Retention Time Absorption Layer Oxygen Diffusion Environmentally Friendly Reactive Rf Magnetron Sputter Passivation Film Oxide Buffer Layer Performance Degradation Spatial Variation Transparent Heaters Device Performance Excitatory Postsynaptic Current(EPSC) Plasma-Enhanced Chemical Vapor Deposition Technique Polyimide (Pi) Film Hybrid Thin Film Poly-Si Thin Film Nano-Scale Optimal Time N-Type Conduction Raman Scattering(SERS) Energy Harvesting(EH) Low Hysteresis Indoor Illumination Cie 1931 Chromaticity Diagram Si-Cap Long-Term Plasticity Fermi Level Chemical Etch Reducing Agent P- And N-Type High Yield High Current Density Various Conditions Structural Properties Liquid Precursor Rhenium Disulfide Lattice Distortion Gate Length Cation Intercalation Best Performance Roughness Development Electrical Pulses Silicon Oxide Top Gate Dielectric Contact Effects Visible Wavelength Transparent Films Voltage Source Film Roughness Deposition Rate Optical Simulation Spin-Coated Crystalline Phase Transition Semitransparent Organic Photovoltaics Limiting Characteristics Vanadium Sesquioxide Electrical Oscillation Al Alloying Active Layer And Heat Transfer Low Resistance Light-Sensitive First Stokes(S1) Single-Crystalline Single-Gate(SG) P-Type Zno Amorphous Silicon Thin Film Oxide Layer Energy Band Gap Antireflection Properties Voltage Transfer Characteristic Metal Precursor Reaction Layer Microcrystalline Silicon Pv Applications Capacitance-Voltage Compensation Technology Quasi-Steady-State Isolation Effect Iot Applications Short Channel Drain-Induced Barrier Lowering(DIBL) Metal Films Ar Plasma Induced Resistance Mass Production Amorphous Films Amorphous Si Films Fabric Substrates Maximum Efficiency Standard Resistor Oxide Interface Hydrogen Plasma Treatment Improved Cell Efficiency Hcl Solution Thin Film Photovoltaic Characteristics Curves Growth Method Gas Pressure Single Junction Solar Cells E-Textiles Indium Tin Oxide(ITO) Information Detection Interfacial Quality Thin-Film Silicon Solar Cells Ambient Conditions Electrical Characteristics One-Step Hetero-Interface Large Numbers Surface Recombination Borosilicate Glasses Unique Solution Critical Micelle Concentration (Cmc) Neuromorphic System F-Doped Efficiency Improvement Reducing Gases State Memory Conduction Properties Control Technique High Bandgap Thickness Ratio Two-Step Annealing Low Temperature Deposition Film Growth Scattering Matrix Bending Cycles Oxide Transistors Information Perception Plasma Etching Process Switching Mechanism Amorphous Surfaces Conductivity Enhancement Surface States Thin Absorber Carrier Collection Insulating Properties Chemical Vapor Deposition Process Acetic Acid(AA) Human Brain Applied Electric Field Modulation-Doped(MD) Metal Electrode Plasma Application 1 H Stainless Steel Foil Substrate Silicon-Germanium(SiGe) Ar Coating Uv-Vis Spectrophotometry Low Deposition Temperature Light Conversion Efficiency Electrode Materials Interference Effects Flexible Substrate Recombination Losses Long-Term Performance Pulse Number Nitric Acid Solution Voltage Pulse Transmission And Reflection Tio2 Thin Films Electric Vehicle(EV) Ir Spectrum Electrospun Nanofibers Supply Power White Led Working Pressure N-Doped Zno Gas Mixture Thin Electrodes Memory-Based Plastic Material Semiconductor Materials Electric Characteristics Low Temperature Bonding Thin Film Heaters Wavelength Range Surface Energy High Speed Ti Source Flexible Film Joule Heating Enhanced Conductivity CF 4 Module Performance Superstrate-Type Few-Layer Solution-Based Process Crystalline Films Visible Transmittance Cover Layer Etching Characteristics Temperature Variations Colorless Polyimide Conducting Polymers Highest Efficiency Structural And Optical Properties Buffer Layer Thickness Large-Scale Synthesis Impurity Content Channel Current Color Coordinates Chamber Pressure Material Characteristics Gate Driver Channel Length Laser Energy Semitransparent Cell Scan Range Conductive Fabric Enhancement-Mode Small-Sized Attention Mechanism Shadow Deposition Film Quality Critical Temperature Shallow Traps Highly Transparent Transmission Spectra Laser Irradiation Dielectric Materials Intrinsic Hydrogenated Amorphous Silicon Current-Voltage Characteristics 42 V Minority Carrier Lifetime V-Shape Improved Performance Defect-Free Fowler-Nordheim Stress Transparent Conducting Electrode(TCE) On-State Current