ETRI-Knowledge Sharing Plaform

Transparent Thin Film Transistor(TTFT) Oxide Thin-Film Transistors Gate Insulator Oxide Tfts Top-Gate Active Layer Touch Screen Panel(TSP) Amorphous Indium-Gallium-Zinc Oxide(a-IGZO) Field-Effect Mobility Room-Temperature Transparent Electrode Ionized Physical Vapor Deposition(IPVD) Ito Film Drain Current Subthreshold Swing(SS) Zinc Tin Oxide Applied Physics Electrical Stability Igzo Thin Film Zn-Sn-O(ZTO) Transparent Heaters Post-Annealing Current On-Off Ratio Tail States Bias Stability Double-Channel Vapor Deposition Method Ti-Doped Ito Mobility Fluctuation Reactive Sputtering High Performance Al-Zn Double Layered Electrical Performance Initialization Vector(IV) Zno Thin Films Silicon Quantum Dots Turn-On Voltage Oxide Thin Films Atomic Ratio Glass Substrate Voltage-Dependent Capacitive Touch Screen Dc Magnetron Sputtering Optical Transmittance Rf Magnetron Sputtering Hybrid Electrode Er Doping Low Frequency Noise Cu-Doped Zno Dielectric Layer Structural And Optical Properties Transparent Oxide Semiconductor Small Form Factor Wide Range Stress Test 1 H Active Matrix Electrical Characteristics Multilayer Electrode Mo-Doped Zno(ZnO:Mo) Positive Bias Transparent Electronics Highly Transparent Aperture Ratio Channel Length Gas Mixture Transparent Display AM-OLED Active Channel Combinatorial Method Cell Patterns Channel Structure Dry Etching Indium Tin Oxide Electrodes Touch Sensor Large Size Sputtering Process Silver Nanowire(AgNW) Zn Oxide High Sensitivity Amorphous Igzo Analytical Modeling Ag Nanowires Nonvolatile Memory Devices Next-Generation Noise Power Source And Drain Wet Etching Process Constant Current Stress Gate Dielectric Ito Thin Film Oxidizing Atmosphere A-Igzo Tfts Doped Zno Films Communication Technologies Model-Based Optical And Electrical Properties Zno Electrode Rf Power Single-Layer Seed Layer Process Development Channel Layer Gate Voltage Icp Power Normalized Noise 20 Nm Comparative Study Charge Trapping Physical Model Silicon Oxide Ultra-Thin High Deposition Rate Ag Thin Film Amorphous-Like Current Noise Doped Oxide Cell Structure Device Degradation Flexible Device Device Stability Doping Effects Electron Beam Irradiation Formation Process Gate Electrode Interfacial Trap Technical Barrier Ict Convergence Low Drain Voltage Low Pressure Chemical Vapor Deposition Low Temperature Fabrication Mobile Charges Protection Layer Optical Recording System Process Temperature Power Spectral Density(PSD) Petri Net(PN) P-N Junction P-Type Conductivity Run-Out Radio Frequency(RF) Selective Epitaxial Growth(SEG) Sputtering Pressure Square Pattern Touch Sensitivity Teo 2 Effect Of Oxygen Out-Diffusion Highly Conductive High Mobility Transistor Azo Thin Films Ag Deposition Atomic Layer Deposition Battery Voltage Blu-Ray Contact Electrodes Crystal Structure Density Of Trap States Dc Power Supply Etching Selectivity Electric Car Gan Led Gate Bias Stress Ga Content Interface Formation Improved Crystallinity Improved Stability Inductively Coupled Plasma Reactor In-Situ Crystallization Threshold Voltage Shift Thermal Process Low Temperature Processing New Type Plasma Power Plasma-Enhanced Chemical Vapor Deposition(PECVD) Red Emitting 1/F Noise Rectifying Characteristics Small Area Silicon Nitride Film Series-Connected Xrd Measurements X-Ray Photoelectron Spectroscopy (Xps) Zinc-Doped Zno Target Thermal Sensors Al-Doped Zno(ZnO:Al) Ag Layer Conductive Oxide Carbon Nano-Tube(CNT) Current Spreading Current-Voltage (I-V) Characteristics Constant Dc Compositional Ratios Chemically Strengthened Glass Channel Material Copper Material Dynamic Bending Test Drain Electrode Efficiency Droop Electronic Materials Gate Leakage Current Integrated Circuit Ito Electrode Thermal Stability(TGA) Led Applications Layer Effect Large-Area Electronics Long-Distance Layer Composition Mobile Device Application Magnetron Co-Sputtering System Matching Layer Negative Shift Oxide Gate Oxide Channel Oled Display Orders Of Magnitude Nano-Crystalline Oxide Material Photo Resist Organic Light-Emitting Device(OLED) Optimum Condition Planar Structure Plasma Density Remote Phonon Scattering Re-Sputtering Subthreshold Slope(SS) Stability And Performance Spectroscopy Analysis Supersaturation Ratio Short-Range Ordering Surface Uniformity Trade-Off 5 Nm E-Beam Ti Thin Film Work Function Hole Type High-Density Anneal Treatment Amorphous Silicon Band-Gap Energy Buffer Layer Bottom Gate Structure Current-Voltage Measurements Carrier Concentration Cu Concentration Carrier Density Cu-Contamination Co-Planar Electrical And Mechanical Properties Enhanced Mobility Ferroelectric Polarization I-V Measurement Transparent Conductive Thermal Properties Trap Sites Low Light Large Area Devices Loading Effect Metal Nanowires Mobile Devices Multi-Touch N-Type Doping Non-Uniformity O Atoms P-Gan Plasma Process Optoelectrical Properties Oxygen Vacancies Process Window Process Zone Post-Heat Treatment Rewritable Optical Disks Surface Roughness Sputter Deposition Zn Concentration Low Resistivity Uv Lamp Power Law Ag-Doped Azo Film Amorphous Ingazno Thin Film Blue Light-Emitting Diodes Bond Enthalpy Cooling Water Device Performance Device Applications Device Characteristics Electrical And Optical Properties Exponential Distribution Electronic Properties Frequency Range Fabrication And Characterization Interfacial Layer Good Stability Trapped Electron(TE) Transparent Contact Layer Low Transmittance Long-Run Metal-Doped Metal Grid Low Sheet Resistance Metallic Sb Output Characteristics Oxygen Binding Organic And Inorganic Materials Output Current Process Optimization Pl Intensity Polymer Materials Post Deposition Treatment Protective Layer Positive And Negative Semiconductor Films Scattering Parameters(S-parameters) Reactive Rf Magnetron Sputter Sn-Doped Zno Solid Solutions Stability Characteristics Zno-Sno 2 Voltage Sweep Vdf-Trfe Touch Performance Tilt Margin Light Effect Edge Shape Ingazno Tfts Hysteresis Curve High Yield Hybrid Type High Linearity Amorphous Oxide Semiconductor Binding Energy Contact Noise Contact Hole Direct Current(DC) Flat Panel Display(FPD) Gate Oxide Glass Surface Time Dependence Light Output Power(Lop) Multilayer Films Mechanical Durability Potassium Ions Quantum Dot Film Potential Applications Pressure Sensitive Quartz Tube Roll-To-Roll Rf Sputtering Smooth Surface First Stokes(S1) Single Channel Spin-Coating Method 3.5 Mm Visible Light Illumination Gallium Nitride(GaN) High Transparency Heat-Treated Artificial Skin Compensation Effect Charge Injection Co-Sputtering Method Channel Noise Dependence Of Threshold Voltage Flexible Sensors Gan-Based Leds Igzo Target In-Sn-Zn-O Ion Beam Deposition Transparent Memristor Trapping Behavior Light Scattering Layered Oxide High Electron Mobility Transistor(HEMT) Metal Electrode Metal Foil Negative Bias Off Current Plasma Effects Optoelectronic Devices Photo-Generated Holes Processing Diagrams Power Spectra Density Rf Magnetron Co-Sputtering Reduction Of Oxygen Si-Based Sputtering Target Structural And Electrical Properties Tin Oxide Films Two-Step Annealing Ito Target Wavelength Range High Speed High Capacitance Oxygen Bonding Applied Voltage Combinatorial Approach Cover Layer Doped Sno 2 Chemical Strengthening Doping Method Capacitive-Type Dielectric Materials Enhancement-Mode Flexible Substrate Flexible Pressure Sensors Gas-Phase Reactions Good Crystallinity Transparent Tft Ti Doping Ti Film Thermal Annealing Metallic Zinc New Device Overall Performance Overdrive Voltage Optimization Methods Organic-Inorganic Pulse Width Polyethylene Terephthalate (Pet) Substrates Reliable Transfer Relative Intensity White Led 5 Mol%(MgO)