ETRI-Knowledge Sharing Plaform

Thin-Film Transistor(TFT) High Performance Low Temperature(LT) Organic Light-Emitting Diodes(OLEDS) Near-Infrared(NIR) Flexible Substrate Organic Photodiode Current Efficiency Grazing-Incidence Small-Angle X-Ray Scattering Graphene Anode Formation Mechanism Photolithography Process Protection Layer Surface Contamination Full-Color Absorption Features Atomic Layer Deposition Device Architecture Stacked Oled Film Thickness Flexible Oleds Flexible Display Oled Display Oxide Channel Noise Equivalent Power Small Molecular Temporal Response Vertical Stacking Scattering Experiments External Quantum Efficiency High-Density 10-Phenanthroline(BCP) Pixel Array Deposition Method Growth And Transfer Lens Array Organic Materials Oxide Tfts Surface Tension(ST) Top-Emitting 20 Nm Thin-Film Photodiode Charge Extraction Emissive Layer(EL) Molybdenum Oxide Optical Simulation Patterned Graphene Stacked Structure Sub-Pixel Thermal Release Active Layer Thickness Active Devices Dark Current Graphene Films High-Resolution Displays Indium Tin Oxide(ITO) Intermediate Electrodes Large-Area Graphene 9-Dimethyl-4 Transparent Electrode Technical Feasibility Vacuum Deposition Aperture Ratio Bulk Heterojunction Current Injection Detection Band Gen 2 Low Noise Linear Dynamic Range Level Production Manufacturing Processes 7-Diphenyl-1 Photoactive Layer Stainless Steel(SUS316)