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학술지 Monolithic SiGe Up-/Down-Conversion Mixers with Active Baluns
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저자
이상흥, 이승윤, 배현철, 이자열, Sang-Hoon Kim, 김보우, 강진영
발행일
200510
출처
ETRI Journal, v.27 no.5, pp.569-578
ISSN
1225-6463
출판사
한국전자통신연구원 (ETRI)
DOI
https://dx.doi.org/10.4218/etrij.05.0905.0034
협약과제
04MB3100, H/W로 재구성 가능한 차세대 지능형 통합단말용 SoC(차세대 통합 휴대 단말 기술), 조경익
초록
The purpose of this paper is to describe the implementation of monolithically matching circuits, interface circuits, and RF core circuits to the same substrate. We designed and fabricated on-chip 1 to 6 GHz up-conversion and 1 to 8 GHz down-conversion mixers using a 0.8 μm SiGe hetero-junction bipolar transistor (HBT) process technology. To fabricate a SiGe HBT, we used a reduced pressure chemical vapor deposition (RPCVD) system to grow a base epitaxial layer, and we adopted local oxidation of silicon (LOCOS) isolation to separate the device terminals. An up-conversion mixer was implemented on-chip using an intermediate frequency (IF) matching circuit, local oscillator (LO)/radio frequency (RF) wideband matching circuits, LO/IF input balun circuits, and an RF output balun circuit The measured results of the fabricated up-conversion mixer show a positive power conversion gain from 1 to 6 GHz and a bandwidth of about 4.5 GHz. Also, the down-conversion mixer was implemented on-chip using LO/RF wideband matching circuits, LO/RF input balun circuits, and an IF output balun circuit The measured results of the fabricated down-conversion mixer show a positive power conversion gain from 1 to 8 GHz and a bandwidth of about 4.5 GHz.
KSP 제안 키워드
5 GHz, 6 GHz, Active Balun, Conversion gain, Down-conversion mixer, Epitaxial layer, Heterojunction Bipolar Transistors(HBTs), Interface circuit, Intermediate frequency, Local Oscillator, Local oxidation