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Journal Article Monolithic SiGe Up-/Down-Conversion Mixers with Active Baluns
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Authors
Sang-Heung Lee, Seung-Yun Lee, Hyun-Chul Bae, Ja-Yol Lee, Sang-Hoon Kim, Bo Woo Kim, Jin-Yeong Kang
Issue Date
2005-10
Citation
ETRI Journal, v.27, no.5, pp.569-578
ISSN
1225-6463
Publisher
한국전자통신연구원 (ETRI)
Language
English
Type
Journal Article
DOI
https://dx.doi.org/10.4218/etrij.05.0905.0034
Abstract
The purpose of this paper is to describe the implementation of monolithically matching circuits, interface circuits, and RF core circuits to the same substrate. We designed and fabricated on-chip 1 to 6 GHz up-conversion and 1 to 8 GHz down-conversion mixers using a 0.8 μm SiGe hetero-junction bipolar transistor (HBT) process technology. To fabricate a SiGe HBT, we used a reduced pressure chemical vapor deposition (RPCVD) system to grow a base epitaxial layer, and we adopted local oxidation of silicon (LOCOS) isolation to separate the device terminals. An up-conversion mixer was implemented on-chip using an intermediate frequency (IF) matching circuit, local oscillator (LO)/radio frequency (RF) wideband matching circuits, LO/IF input balun circuits, and an RF output balun circuit The measured results of the fabricated up-conversion mixer show a positive power conversion gain from 1 to 6 GHz and a bandwidth of about 4.5 GHz. Also, the down-conversion mixer was implemented on-chip using LO/RF wideband matching circuits, LO/RF input balun circuits, and an IF output balun circuit The measured results of the fabricated down-conversion mixer show a positive power conversion gain from 1 to 8 GHz and a bandwidth of about 4.5 GHz.
KSP Keywords
5 GHz, 6 GHz, Active baluns, Conversion gain, Down-conversion mixer, Epitaxial layer, Hetero-junction Bipolar Transistor(HBT), Interface circuit, Local oxidation, Oxidation of silicon, Power Conversion