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Journal
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2018 |
DC and RF Characteristics of Enhancement-Mode Al2O3/AlGaN/GaN MIS-HEMTs Fabricated by Shallow Recess Combined with Fluorine-Treatment and Deep Recess
Jung Hyunwook ECS Journal of Solid State Science and Technology, v.7, no.4, pp.197-200 |
3 |
원문
|
|
Conference
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2013 |
Sub-22 nm Silicon Template Nanofabrication by Advanced Spacer Patterning Technique for NIL Applications
Park Jong-Moon Alternative Lithographic Technologies V (SPIE 8680), pp.1-8 |
0 |
원문
|
|
Journal
|
2011 |
Dry Etching of TiN in N2/Cl2/Ar Adaptively Coupled Plasma
Kim Dong -Pyo Vacuum, v.86, no.4, pp.380-385 |
5 |
원문
|