Subjects : dry film resist
Type | Year | Title | Cited | Download |
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Journal | 2005 | Fabrication Process for Polymer PLC Platforms with V-Grooves for Passive Alignment Park Suntak Optics Communications, v.256, no.1-3, pp.108-113 | 1 | 원문 |
Conference | 2004 | Novel lithography process for extreme deep trench by using laminated negative dry film resist Jung Moon Youn International Conference on Micro Electro Mechanical Systems (MEMS) 2004, pp.685-688 | 원문 |
Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
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Type | Year | Research Project | Primary Investigator | Download |
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