Subjects : low-temperature plasma-enhanced atomic layer deposition
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2010 | A Low-Temperature-Grown TiO2-Based Device for the Flexible Stacked RRAM Application Hu Young Jeong Nanotechnology, v.21, no.11, pp.1-6 | 134 | 원문 |
| Journal | 2008 | Vanadium Dioxide Films Deposited on Amorphous SiO2- and Al2O3-Coated Si Substrates by Reactive RF-Magnetron Sputter Deposition Sun Jin Yun Japanese Journal of Applied Physics, v.47, no.4, pp.3067-3069 | 22 | 원문 |
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