Subjects : Bilayer resist
| Type | Year | Title | Cited | Download |
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| Journal | 2014 | Optimisation of Bi-Layer Resist Overhang Structure Formation and SiO2 Sputter-Deposition Process for Fabrication of Gold Multi-Electrode Array Kim Yong Hee RSC Advances, v.5, no.9, pp.6675-6681 | 5 | 원문 |
| Conference | 2006 | 50㎚ E-Beam Lithography Process using a Bilayer Resist Structure for Nano T-gate MHEMTs Shim Jae Yeob International Symposium on the Physics of Semiconductors and Applications (ISPSA) 2006, pp.1-1 |
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