Subjects : Pre-passivation
Type | Year | Title | Cited | Download |
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Journal | 2006 | Fabrication and Characteristics of 0.12 μm Single and Double-Recessed Gate AlGaAs/InGaAs/GaAs PHEMTs Using a SiNx Pre-Passivation Layer Jong-Won Lim Journal of the Korean Physical Society, v.49, no.3, pp.S774-S779 | ||
Conference | 2006 | Fabrication and Characteristics of 0.12 μm Single and Double-Recessed Gate AlGaAs/InGaAs/GaAs PHEMTs Using a SiNx Pre-Passivation Layer Jong-Won Lim 한국반도체 학술 대회 (KCS) 2006, pp.1-2 |
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