Subjects : High breakdown field
Type | Year | Title | Cited | Download |
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Journal | 2018 | Technical Trends of Semiconductors for Harsh Environments Woojin Chang 전자통신동향분석, v.33, no.6, pp.12-23 | 원문 | |
Journal | 2016 | Improved stability of electrical properties of nitrogen-added Al 2 O 3 films grown by PEALD as gate dielectric Lee Da Jung Materials Research Bulletin, v.83, pp.597-602 | 12 | 원문 |
Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
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Type | Year | Research Project | Primary Investigator | Download |
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