Subjects :
plasma chemistry
논문 검색결과
| Type |
Year |
Title |
Cited |
Download |
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Journal
|
2011 |
Analysis of Etching Mechanism and Etched Slope Control of Silicon for Nanoimprinting Lithography
함용현 Journal of Nanoscience and Nanotechnology, v.11, no.7, pp.6523-6527 |
0 |
원문
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Journal
|
2011 |
Etching characteristics and mechanism of Ga-doped ZnO thin films in inductively-coupled HBr/X (X = Ar, He, N2, O2) plasmas
함용현 Vacuum, v.85, no.11, pp.1021-1025 |
10 |
원문
|
|
Journal
|
2010 |
Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas
김문근 Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-6 |
5 |
원문
|
|
Journal
|
2010 |
Etching Characteristics and Mechanism of ZnO and Ga-Doped ZnO Thin Films in Inductively Coupled HBr/Ar/CHF3 Plasma
함용현 Japanese Journal of Applied Physics, v.49, no.8 PART 2, pp.1-5 |
5 |
원문
|
특허 검색결과
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Family Pat. |
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연구보고서 검색결과
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