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Registered HIGH ELECTRON MOBILITY TRANSISTOR AND FABRICATION METHOD THEREOF

Inventors
Hokyun Ahn, Eun Soo Nam, Jong-Won Lim, Kim Seong-Il, Kim Dong-Young, Min Byoung-Gue, Jung Hyunwook, Kwon Yong-Hwan, Lee Sang-Heung, Jae Won Do, Kyu Jun Cho, Hae Cheon Kim, Hyung Sup Yoon, Dong Min Kang, Jongmin Lee
Application No.
15/248676 (2016.08.26)
Registration No.
10134854 (2018.11.20)
Country
UNITED STATES
Project Code
15MB1800, Development of High Efficiency GaN-based Key Components and Modules for Base and Mobile Stations, Jong-Won Lim
KSP Keywords
Fabrication method, High electron, High electron mobility, High electron mobility transistor(HEMT), electron mobility
Family
 
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Status Patent Country KIPRIS
Registered HIGH ELECTRON MOBILITY TRANSISTOR AND FABRICATION METHOD THEREOF KOREA KIPRIS