Registered
		SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
	
	
		
		
		
		
			- Inventors
 
			- 
				Hyung Seok Lee, Hokyun Ahn, Jang Yoo Jin, Hae Cheon Kim, Hyung Sup Yoon, Mun Jae Kyoung, Jong-Won Lim, Kim Seong-Il, Woojin Chang, Lee Sang-Heung, Shin Min Jeong, Sungjae Chang, Kyu Jun Cho, Bae Sung-Bum, Kim Zin-Sig, Kim Dong-Young, Kim Jeong Jin, Min Byoung-Gue, Jongmin Lee, Dong Min Kang, Jae Won Do, Ji Hong Gu, Jung Hyunwook
 
		
		
		
					- Application No.
 
					- 
						16839964 (2020.04.03)
						
 
				
			
					- Publication No.
 
					- 
						20200235028 (2020.07.23)
						
 
				
			
					- Registration No.
 
					- 10784179 (2020.09.22)
 
				
			
				- Country
 
				- UNITED STATES
 
			
		
				- Project Code
 
				- 
						17HB2400, Development of High Efficiency GaN-based Key Components and Modules for Base and Mobile Stations,
							Jong-Won Lim 
							
 
				
		
				- Abstract
 
				- A method for fabricating a semiconductor device includes sequentially laminating a separation layer and a first substrate layer on a sacrificial substrate, and forming a heat dissipation plate comprising a first region and a second region on the first substrate layer. The method further includes removing the sacrificial substrate and the separation layer, and patterning the first substrate layer to form a first substrate exposing the heat dissipation plate in the second region and contacting the heat dissipation plate in the first region, and forming a first element on the first substrate. The method still further includes forming a plurality of conductive pads disposed on the heat dissipation plate in the second region and a first line connecting at least one of the plurality of conductive pads to the first element, and forming a second element on the conductive pads in the second region.
 
			
		
				- KSP Keywords
 
				- Heat dissipation, Sacrificial substrate, Separation layer, semiconductor device
 
			
		
				- Family
 
				-