05ZB1200, SiGe-based Quantum Channel Nano-Device Technology,
Young Joo Song
Abstract
본 연구실이 확보하고 있는 SiGe 반도체 기술 resource로 나노 신소자의 기반기술을 개발하여 향후 부딪히게 될 특허분쟁, 기술료 등의 문제를 공략하기 위해 원천기술의 발굴 및 특허확보, 국내의 학계와 산업체와 긴밀한 협조에 의한 연구 저변확대, 독창적 아이디어의 발굴, 실용화 체계강화에 역점을 두어 추진한다. 1. 원천기술 발굴 및 지적재산권 확보 : 기존의 SFET 구조관련 특허의 기능해석, 문제점 분석, 한계특성 해석을 통한 새로운 SFET 구조제안 및 핵심 원천기술개발 - 고이동도 SiGe/Si QW on SOI 구조 성장기술($X_{Ge}=0.2$) - SiGe SFET 구조 최적화 연구 - 저온 래디컬 게이트 절연막 기술 (RAON)개발 - 1/f 잡음 측정분석 연구 2. 국내연구 실리콘-게르마늄 반도체 기술저변 확대 : 학계(초빙교수), 산업체등과 실리콘-게르마늄 반도체 신소자 기술(가칭) 협의체를 구성 및 워크샵 개최 3. 국외정보 수집 및 기술교류 확대 : IQE, Intel, UNAXIS 둥의 해외업체 등과 협력관계 유지 및 정보교류
Copyright Policy
ETRI KSP Copyright Policy
The materials provided on this website are subject to copyrights owned by ETRI and protected by the Copyright Act. Any reproduction, modification, or distribution, in whole or in part, requires the prior explicit approval of ETRI. However, under Article 24.2 of the Copyright Act, the materials may be freely used provided the user complies with the following terms:
The materials to be used must have attached a Korea Open Government License (KOGL) Type 4 symbol, which is similar to CC-BY-NC-ND (Creative Commons Attribution Non-Commercial No Derivatives License). Users are free to use the materials only for non-commercial purposes, provided that original works are properly cited and that no alterations, modifications, or changes to such works is made. This website may contain materials for which ETRI does not hold full copyright or for which ETRI shares copyright in conjunction with other third parties. Without explicit permission, any use of such materials without KOGL indication is strictly prohibited and will constitute an infringement of the copyright of ETRI or of the relevant copyright holders.
J. Kim et. al, "Trends in Lightweight Kernel for Many core Based High-Performance Computing", Electronics and Telecommunications Trends. Vol. 32, No. 4, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
J. Sim et.al, “the Fourth Industrial Revolution and ICT – IDX Strategy for leading the Fourth Industrial Revolution”, ETRI Insight, 2017, KOGL Type 4: Source Indication + Commercial Use Prohibition + Change Prohibition
If you have any questions or concerns about these terms of use, or if you would like to request permission to use any material on this website, please feel free to contact us
KOGL Type 4:(Source Indication + Commercial Use Prohibition+Change Prohibition)
Contact ETRI, Research Information Service Section
Privacy Policy
ETRI KSP Privacy Policy
ETRI does not collect personal information from external users who access our Knowledge Sharing Platform (KSP). Unathorized automated collection of researcher information from our platform without ETRI's consent is strictly prohibited.
[Researcher Information Disclosure] ETRI publicly shares specific researcher information related to research outcomes, including the researcher's name, department, work email, and work phone number.
※ ETRI does not share employee photographs with external users without the explicit consent of the researcher. If a researcher provides consent, their photograph may be displayed on the KSP.