Subjects :
Etch characteristics
논문 검색결과
| Type |
Year |
Title |
Cited |
Download |
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Journal
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2023 |
Light field microscope target with low power, low pressure reactive ion etching process
Kim Chihoon Current Applied Physics, v.50, pp.127-132 |
1 |
원문
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Journal
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2014 |
The Fabrication of an Applicative Device for Trench Width and Depth Using Inductively Coupled Plasma and the Bulk Silicon Etching Process
Woo Jong Chang Transactions on Electrical and Electronic Materials, v.15, no.1, pp.49-54 |
1 |
원문
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|
Journal
|
2011 |
Etching characteristics and mechanism of Ga-doped ZnO thin films in inductively-coupled HBr/X (X = Ar, He, N2, O2) plasmas
함용현 Vacuum, v.85, no.11, pp.1021-1025 |
10 |
원문
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|
Journal
|
2008 |
Etching Characteristics of Al2O3 Thin Films in Inductively Coupled BCl3/Ar Plasma
Sun Jin Yun Vacuum, v.82, no.11, pp.1198-1202 |
14 |
원문
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특허 검색결과
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연구보고서 검색결과
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