Subjects : plasma modeling
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2012 | Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Cl 2/Ar Inductively Coupled Plasma 김대희 Japanese Journal of Applied Physics, v.51, no.10, pp.1-5 | 3 | 원문 |
| Journal | 2012 | Etching Characteristics and Mechanisms of TiO2 Thin Films in HBr/Ar and Cl2/Ar Inductively-Coupled Plasmas 장한별 Plasma Chemistry and Plasma Processing, v.32, no.2, pp.333-342 | 3 | 원문 |
| Journal | 2008 | Effect of gas mixing ratio on etch behavior of ZrO2 thin films in BCl3∕He inductively coupled plasma 김만수 Journal of Vacuum Science and Technology A, v.26, no.3, pp.344-351 | 14 | 원문 |
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| Type | Year | Research Project | Primary Investigator | Download |
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