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Journal
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2008 |
New fabrication of a strained Si/Si1−yGey dual channel on a relaxed Si1−xGex virtual substrate using a Ge-rich layer formed by oxidation
Kim Sang Hoon Applied Surface Science, v.254, no.19, pp.6025-6029 |
1 |
원문
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Conference
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2006 |
Structure Optimization of Strained Si/Si1-yGey Dual-Channel Heterostructures on Relaxed Si1-xGex (x
Kim Sang Hoon MRS Meeting 2006 (Fall), pp.1-2 |
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Journal
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2006 |
A New Strained-Si Channel High Voltage MOSFET for High Performance Power Applications
Cho Young Kyun ETRI Journal, v.28, no.2, pp.253-256 |
10 |
원문
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Journal
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2005 |
Strained-SiGe Complementary MOSFETs Adopting Different Thickness of Silicon Cap Layers for Low Power and High Performance Applications
Bongki Mheen ETRI Journal, v.27, no.4, pp.439-445 |
8 |
원문
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