Subjects : Critical dimension
| Type | Year | Title | Cited | Download |
|---|---|---|---|---|
| Journal | 2011 | Analysis of Etching Mechanism and Etched Slope Control of Silicon for Nanoimprinting Lithography 함용현 Journal of Nanoscience and Nanotechnology, v.11, no.7, pp.6523-6527 | 0 | 원문 |
| Journal | 2011 | Sub-30 nm Gate Template Fabrication for Nanoimprint Lithography Using Spacer Patterning Technology Park Kun Sik Journal of Nanoscience and Nanotechnology, v.11, no.2, pp.1625-1628 | 5 | 원문 |
| Conference | 2009 | Sub-30 nm Gate Template Fabrications for Nanoimprint Lithography using Spacer Patterning Technology Park Kun Sik International Conference on Nano Science and Nano Technologya (ICNSN) 2009, pp.1-4 |
| Status | Year | Patent Name | Country | Family Pat. | KIPRIS |
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| Type | Year | Research Project | Primary Investigator | Download |
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